창성주식회사

PRODUCT

  • PRODUCT SEMICONDUCTOR

Diffusion

ETCH

  • PRODUCT SEMICONDUCTOR DIFFUSION

1. Pre Diffusion Wetstation

ディフュージョン前に洗浄装備を意味し、 主にSC-1 HF化学溶液処理を利用した洗浄装備

Wet Cleaner is remove the particles on the surface of the wafer in the bath

  • Size dimension may vary per customer's option
  • Automatic Transfer by WTR
  • Non Contact Transfer : CST Transfer system
  • Full automated by PLC & CIM PC
  • Hot Diw & Chemical (option)
  • System : Sonic, Bubble Jet, Spray, Dry (option)

2. Tube Cleaner

Furnaceで拡散工程の前にQuartz tube、Quartz toolなどをHF、HNO3の化学溶液処理を利用してtubeに残存するPolymerなどを除去するための洗浄装備

Wet Cleaner is remove the particles on the surface of the wafer in the bath

  • Size dimension may vary per customer's option
  • Automatic Transfer by WTR
  • Non Contact Transfer : CST Transfer system
  • Full automated by PLC & CIM PC
  • Hot Diw & Chemical (option)
  • System : Sonic, Bubble Jet, Spray, Dry (option)

3. Part Cleaner

工程前後で薬液やDI.Wを利用してProcess Kitなどを洗浄する装備

Wet Cleaner is remove the particles on the surface of the wafer in the bath

  • Size dimension may vary per customer's option
  • Automatic Transfer by WTR
  • Non Contact Transfer : CST Transfer system
  • Full automated by PLC & CIM PC
  • Hot Diw & Chemical (option)
  • System : Sonic, Bubble Jet, Spray, Dry (option)

  • PRODUCT SEMICONDUCTOR ETCH

1. Solvent Wetstation

金属(Metal)蒸着後PR(Photo resister)を除去する工程の装備としてSolvent、IPAなどの薬液で不純物や表面洗浄をする装備。

Wet Cleaner is remove the particles on the surface of the wafer in the bath

  • Size dimension may vary per customer's option
  • Automatic Transfer by WTR
  • Non Contact Transfer : CST Transfer system
  • Full automated by PLC & CIM PC
  • Hot Diw & Chemical (option)
  • System : Sonic, Bubble Jet, Spray, Dry (option)

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