- PRODUCT SEMICONDUCTOR
Diffusion
ETCH
Diffusion
ETCH
这是扩散前的洗净装备,主要用SC-1, HF药水。
Wet Cleaner is remove the particles on the surface of the wafer in the bath
这是洗净装备,在Furnace扩散工程之前用HF,HNO3等药水来洗净Quartz tube, Quartz too里tube上残留的Polymer等等。
Wet Cleaner is remove the particles on the surface of the wafer in the bath
这是工程前后利用药水和DLW洗净Process Kit的装备。
Wet Cleaner is remove the particles on the surface of the wafer in the bath
这是金属(Metal)蒸镀后除掉PR(Photo resister)工程的装备,就是用Solvent, IPA等药水来除掉杂物洗净表面的装备。
Wet Cleaner is remove the particles on the surface of the wafer in the bath