-
PRODUCT
SEMICONDUCTOR
Diffusion
ETCH
PRODUCT
SEMICONDUCTOR
Diffusion
ETCH
PRODUCT
SEMICONDUCTOR
DIFFUSION
It refers to cleaning equipment before spreading, and is a cleaning equipment that mainly uses SC-1, HF chemical solution.
Wet Cleaner is remove the particles on the surface of the wafer in the bath
It is a cleaning equipment which before the diffusion process in Furnace, Quartz tube, Quartz tool, etc chemically treated with HF, HNO3, etc., removes stuff such as polymer that is still remaining in the tube.
Wet Cleaner is remove the particles on the surface of the wafer in the bath
A cleaning equipment which cleans the Process Kit, before and after the process of using chemical solutions such as DI.W.
Wet Cleaner is remove the particles on the surface of the wafer in the bath
PRODUCT
SEMICONDUCTOR
ETCH
An equipment to remove PR (Photo resister) after metal deposition. It cleans the impurities and surface using chemicals such as Solvent, IPA.
Wet Cleaner is remove the particles on the surface of the wafer in the bath
