창성주식회사

PRODUCT

Texturing

PSG

※Solar process

Texturing

1. SDR

After usage of chemicals such as KOH, HF, and texturing, cleanse with DI.W Rinse, then take out equipment after drying

Wet Cleaner is removing about particle on the bath & textures the wafer surface

  • Size dimension may vary per customer's option
  • Automatic Transfer by WTR
  • Non Contact Transfer : CST Transfer system
  • Full automated by PLC & CIM PC
  • Hot Diw & Chemical (option)
  • System : Sonic, Bubble Jet, Spray, Dry (option)

2. Texturing Structure and shape

1. PSG

After using HF, DI.W, etc. to remove the oxide film, rinse cleaning, then take out equipment after drying

Wet Cleaner is remove the oxide film and particles on the surface of the wafer in the bath

  • Size dimension may vary per customer's option
  • Automatic Transfer by WTR
  • Non Contact Transfer : CST Transfer system
  • Full automated by PLC & CIM PC
  • Hot Diw & Chemical (option)
  • System : Sonic, Bubble Jet, Spray, Dry (option)

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